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Sheet Resistance of Layer Calculator

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✖Charge a characteristic of a unit of matter that expresses the extent to which it has more or fewer electrons than protons.ⓘ Charge [q]			+10% -10%
✖Electron Doping Silicon Mobility characterizes how quickly an electron can move through a metal or semiconductor when pulled by an electric field.ⓘ Electron Doping Silicon Mobility [μ_n]			+10% -10%
✖Equilibrium Concentration of N-Type is equal to the density of donor atoms because the electrons for conduction are solely given by the donor atom.ⓘ Equilibrium Concentration of N-Type [N_d]			+10% -10%
✖Thickness of Layer is often used for manufacturing casted parts to ensure that wall structure is designed with just the right amount of material.ⓘ Thickness of Layer [t]			+10% -10%

✖Sheet Resistance is the resistance of a square piece of a thin material with contacts made to two opposite sides of the square.ⓘ Sheet Resistance of Layer [R_s]

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Sheet Resistance of Layer Solution

STEP 0: Pre-Calculation Summary

Formula Used

Sheet Resistance = 1/(Charge*Electron Doping Silicon Mobility*Equilibrium Concentration of N-Type*Thickness of Layer)
R_s = 1/(q*μ_n*N_d*t)
This formula uses 5 Variables

Variables Used

Sheet Resistance - (Measured in Ohm) - Sheet Resistance is the resistance of a square piece of a thin material with contacts made to two opposite sides of the square.
Charge - (Measured in Coulomb) - Charge a characteristic of a unit of matter that expresses the extent to which it has more or fewer electrons than protons.
Electron Doping Silicon Mobility - (Measured in Square Meter per Volt per Second) - Electron Doping Silicon Mobility characterizes how quickly an electron can move through a metal or semiconductor when pulled by an electric field.
Equilibrium Concentration of N-Type - (Measured in 1 per Cubic Meter) - Equilibrium Concentration of N-Type is equal to the density of donor atoms because the electrons for conduction are solely given by the donor atom.
Thickness of Layer - (Measured in Meter) - Thickness of Layer is often used for manufacturing casted parts to ensure that wall structure is designed with just the right amount of material.

STEP 1: Convert Input(s) to Base Unit

Charge: 5 Millicoulomb --> 0.005 Coulomb (Check conversion here)
Electron Doping Silicon Mobility: 0.38 Square Centimeter per Volt Second --> 3.8E-05 Square Meter per Volt per Second (Check conversion here)
Equilibrium Concentration of N-Type: 45 1 per Cubic Centimeter --> 45000000 1 per Cubic Meter (Check conversion here)
Thickness of Layer: 100.5 Centimeter --> 1.005 Meter (Check conversion here)

STEP 2: Evaluate Formula

Substituting Input Values in Formula

R_s = 1/(q*μ_n*N_d*t) --> 1/(0.005*3.8E-05*45000000*1.005)

Evaluating ... ...

R_s = 0.116377178435309

STEP 3: Convert Result to Output's Unit

0.116377178435309 Ohm --> No Conversion Required

FINAL ANSWER

0.116377178435309 ≈ 0.116377 Ohm <-- Sheet Resistance

(Calculation completed in 00.004 seconds)

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Created by Rahul Gupta

Chandigarh University (CU), Mohali, Punjab

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< Bipolar IC Fabrication Calculators

Conductivity of N-Type

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Ohmic Conductivity of Impurity

LaTeX Go Ohmic Conductivity = Charge*(Electron Doping Silicon Mobility*Electron Concentration+Hole Doping Silicon Mobility*Hole Concentration)

Impurity with Intrinsic Concentration

LaTeX Go Intrinsic Concentration = sqrt((Electron Concentration*Hole Concentration)/Temperature Impurity)

Breakout Voltage of Collector Emitter

LaTeX Go Collector Emitter Breakout Voltage = Collector Base Breakout Voltage/(Current Gain of BJT)^(1/Root Number)

Sheet Resistance of Layer Formula

LaTeX Go

Sheet Resistance = 1/(Charge*Electron Doping Silicon Mobility*Equilibrium Concentration of N-Type*Thickness of Layer)
R_s = 1/(q*μ_n*N_d*t)

What is the sheet resistance of a semiconductor?

Sheet resistance is a critical electrical property, is used to characterize films of semiconducting and conducting materials. It is a measure of lateral resistance per square area of a film with uniform thickness, and quantifies the ability of electrical charge to travel in the plane of the film.

How to Calculate Sheet Resistance of Layer?

Sheet Resistance of Layer calculator uses Sheet Resistance = 1/(Charge*Electron Doping Silicon Mobility*Equilibrium Concentration of N-Type*Thickness of Layer) to calculate the Sheet Resistance, The Sheet Resistance of Layers formula is influenced by factors such as the resistivity of the material, its thickness, and the area through which the current passes. In semiconductor processing, it's essential to control and optimize the sheet resistance to achieve desired electrical characteristics in different layers of the semiconductor devices, like the metal interconnect layers or polysilicon gates in transistors. Sheet Resistance is denoted by R_s symbol.

How to calculate Sheet Resistance of Layer using this online calculator? To use this online calculator for Sheet Resistance of Layer, enter Charge (q), Electron Doping Silicon Mobility (μ_n), Equilibrium Concentration of N-Type (N_d) & Thickness of Layer (t) and hit the calculate button. Here is how the Sheet Resistance of Layer calculation can be explained with given input values -> 0.116959 = 1/(0.005*3.8E-05*45000000*1.005).

FAQ

What is Sheet Resistance of Layer?

The Sheet Resistance of Layers formula is influenced by factors such as the resistivity of the material, its thickness, and the area through which the current passes. In semiconductor processing, it's essential to control and optimize the sheet resistance to achieve desired electrical characteristics in different layers of the semiconductor devices, like the metal interconnect layers or polysilicon gates in transistors and is represented as R_s = 1/(q*μ_n*N_d*t) or Sheet Resistance = 1/(Charge*Electron Doping Silicon Mobility*Equilibrium Concentration of N-Type*Thickness of Layer). Charge a characteristic of a unit of matter that expresses the extent to which it has more or fewer electrons than protons, Electron Doping Silicon Mobility characterizes how quickly an electron can move through a metal or semiconductor when pulled by an electric field, Equilibrium Concentration of N-Type is equal to the density of donor atoms because the electrons for conduction are solely given by the donor atom & Thickness of Layer is often used for manufacturing casted parts to ensure that wall structure is designed with just the right amount of material.

How to calculate Sheet Resistance of Layer?

The Sheet Resistance of Layers formula is influenced by factors such as the resistivity of the material, its thickness, and the area through which the current passes. In semiconductor processing, it's essential to control and optimize the sheet resistance to achieve desired electrical characteristics in different layers of the semiconductor devices, like the metal interconnect layers or polysilicon gates in transistors is calculated using Sheet Resistance = 1/(Charge*Electron Doping Silicon Mobility*Equilibrium Concentration of N-Type*Thickness of Layer). To calculate Sheet Resistance of Layer, you need Charge (q), Electron Doping Silicon Mobility (μ_n), Equilibrium Concentration of N-Type (N_d) & Thickness of Layer (t). With our tool, you need to enter the respective value for Charge, Electron Doping Silicon Mobility, Equilibrium Concentration of N-Type & Thickness of Layer and hit the calculate button. You can also select the units (if any) for Input(s) and the Output as well.

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