Oxide Capacitance after Full Scaling VLSI Solution

STEP 0: Pre-Calculation Summary
Formula Used
Oxide Capacitance after Full Scaling = Oxide Capacitance per Unit Area*Scaling Factor
Coxide' = Coxide*Sf
This formula uses 3 Variables
Variables Used
Oxide Capacitance after Full Scaling - (Measured in Farad per Square Meter) - Oxide Capacitance after Full Scaling is referred to new capacitance after reducing the dimensions of the MOSFET by full scaling.
Oxide Capacitance per Unit Area - (Measured in Farad per Square Meter) - Oxide Capacitance per Unit Area is defined as the capacitance per unit area of the insulating oxide layer that separates the metal gate from the semiconductor material.
Scaling Factor - Scaling factor is defined as the ratio by which the dimensions of the transistor are changed during the design process.
STEP 1: Convert Input(s) to Base Unit
Oxide Capacitance per Unit Area: 0.0703 Microfarad per Square Centimeter --> 0.000703 Farad per Square Meter (Check conversion ​here)
Scaling Factor: 1.5 --> No Conversion Required
STEP 2: Evaluate Formula
Substituting Input Values in Formula
Coxide' = Coxide*Sf --> 0.000703*1.5
Evaluating ... ...
Coxide' = 0.0010545
STEP 3: Convert Result to Output's Unit
0.0010545 Farad per Square Meter -->0.10545 Microfarad per Square Centimeter (Check conversion ​here)
FINAL ANSWER
0.10545 Microfarad per Square Centimeter <-- Oxide Capacitance after Full Scaling
(Calculation completed in 00.004 seconds)

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Created by Priyanka Patel
Lalbhai Dalpatbhai College of engineering (LDCE), Ahmedabad
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Dayananda Sagar College Of Engineering (DSCE), Banglore
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Oxide Capacitance after Full Scaling VLSI Formula

Oxide Capacitance after Full Scaling = Oxide Capacitance per Unit Area*Scaling Factor
Coxide' = Coxide*Sf

Why does Oxide Capacitance increase after Full Scaling in VLSI?

As the gate oxide thickness decreases during scaling, the capacitance per unit area (Oxide Capacitance) increases.

How to Calculate Oxide Capacitance after Full Scaling VLSI?

Oxide Capacitance after Full Scaling VLSI calculator uses Oxide Capacitance after Full Scaling = Oxide Capacitance per Unit Area*Scaling Factor to calculate the Oxide Capacitance after Full Scaling, The Oxide Capacitance after Full Scaling VLSI formula is defined as new capacitance after reducing the dimensions of the MOSFET by full scaling. Oxide Capacitance after Full Scaling is denoted by Coxide' symbol.

How to calculate Oxide Capacitance after Full Scaling VLSI using this online calculator? To use this online calculator for Oxide Capacitance after Full Scaling VLSI, enter Oxide Capacitance per Unit Area (Coxide) & Scaling Factor (Sf) and hit the calculate button. Here is how the Oxide Capacitance after Full Scaling VLSI calculation can be explained with given input values -> 10.545 = 0.000703*1.5.

FAQ

What is Oxide Capacitance after Full Scaling VLSI?
The Oxide Capacitance after Full Scaling VLSI formula is defined as new capacitance after reducing the dimensions of the MOSFET by full scaling and is represented as Coxide' = Coxide*Sf or Oxide Capacitance after Full Scaling = Oxide Capacitance per Unit Area*Scaling Factor. Oxide Capacitance per Unit Area is defined as the capacitance per unit area of the insulating oxide layer that separates the metal gate from the semiconductor material & Scaling factor is defined as the ratio by which the dimensions of the transistor are changed during the design process.
How to calculate Oxide Capacitance after Full Scaling VLSI?
The Oxide Capacitance after Full Scaling VLSI formula is defined as new capacitance after reducing the dimensions of the MOSFET by full scaling is calculated using Oxide Capacitance after Full Scaling = Oxide Capacitance per Unit Area*Scaling Factor. To calculate Oxide Capacitance after Full Scaling VLSI, you need Oxide Capacitance per Unit Area (Coxide) & Scaling Factor (Sf). With our tool, you need to enter the respective value for Oxide Capacitance per Unit Area & Scaling Factor and hit the calculate button. You can also select the units (if any) for Input(s) and the Output as well.
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